| 李帅,乔冠瑾,杜丹,杨开建,潘光祖,周华.双鞍型天线与螺旋波等离子体的耦合距离对功率沉积的影响[J].南华大学学报(自然科学版),2021,(5):68~73, 91.[LI Shuai,QIAO Guanjin,DU Dan,YANG Kaijian,PAN Guangzu,ZHOU Hua.Influence of Coupling Distance Between Double Saddle Antenna and Helicon Plasma on Power Deposition[J].Journal of University of South China(Science and Technology),2021,(5):68~73, 91.] |
| 双鞍型天线与螺旋波等离子体的耦合距离对功率沉积的影响 |
| Influence of Coupling Distance Between Double Saddle Antenna and Helicon Plasma on Power Deposition |
| 投稿时间：2021-03-23 |
| DOI： |
| 中文关键词: 螺旋波等离子体 双鞍型天线 Trivelpiece-Gould波 功率沉积 |
| 英文关键词:helicon plasma double-saddle antenna Trivelpiece-Gould wave power deposition |
| 基金项目:国家自然科学基金项目(11205086;12075114);湖南省自然科学基金项目(2020JJ4515);湖南省教育厅重点项目(20A432);湖南省核聚变国际科技创新合作基地项目(2018WK4009);衡阳市重点实验室项目(2018KJ108);南华大学核燃料循环技术与装备湖南省协同创新中心开放基金项目(2019KFY23;2019KFZ10) |
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| 中文摘要: |
| 采用自主编写的程序HWAP(helicon wave at plasma)模拟了双鞍型天线与均匀柱状螺旋波等离子体相互作用时耦合距离对功率沉积的影响。模拟结果表明:1)在一定实验条件下,双鞍型天线发射的波在等离子体中同时激发螺旋波和Trivelpiece-Gould(TG)波,控制天线耦合距离可改变TG波在等离子体边界附近的能量沉积分布;2)当天线耦合距离在一定范围内变化时(15.0~30.0 cm),耦合距离的大小能影响螺旋波和TG波在能量沉积过程中起的主导作用;3)当天线放置在等离子体中时,波在等离子体中沉积的总功率随耦合距离的增加而减少,当天线放置在等离子体边界和装置外壁之间时,总功率沉积先增加后减少,存在一个最佳耦合距离使功率沉积最大。 |
| 英文摘要: |
| The influence of coupling distance on power deposition for the interaction between double-saddle antenna and uniform cylindrical helicon plasma is simulated by self-compiled program HWAP. The simulation results show that:1) Under certain experimental conditions, the wave emitted by the double saddle antenna excites both helicon wave and TG wave, the energy deposition distribution of TG wave near the plasma boundary can be changed by controlling the antenna coupling distance.2) When the antenna coupling distance changes in a certain range (15.0~30.0 cm), the coupling distance can affect the dominant role of helicon wave and TG wave in the energy deposition. 3) When the antenna is placed in the plasma, the total power deposition decreases with the increase of coupling distance. When the antenna is placed between the plasma edge and the outer wall of the device, the total power deposition first increases and then decreases. There is an optimal coupling distance to maximize the power deposition. |
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