吴喜军,李志强,单健,周青芝,黄成.基于半导体探测法220Rn测量仪的准确刻度[J].南华大学学报(自然科学版),2015,29(3):6~8.[WU Xi-jun,LI Zhi-qiang,DAN Jian,ZHOU Qing-zhi,HUANG Cheng.The Research on Calibration of 220Rn Measurement about SemiconductorDetection-based 220Rn Measurement Instrument[J].Journal of University of South China(Science and Technology),2015,29(3):6~8.] |
基于半导体探测法220Rn测量仪的准确刻度 |
The Research on Calibration of 220Rn Measurement about SemiconductorDetection-based 220Rn Measurement Instrument |
投稿时间:2015-04-27 |
DOI: |
中文关键词: 连续测量仪 峰重叠因子 220Rn测量仪 刻度 |
英文关键词:continuous measurement instrument peaks overlap factor 220Rn measurement instrument calibration |
基金项目:国家自然科学基金资助项目(11375083;11475082);湖南省衡阳市科技计划基金资助项目(2013KJ30) |
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中文摘要: |
采用多道脉冲幅度分析器测定216Po 6.78 MeV能谱峰对6.00 MeV计数区的峰重叠因子μ为0.0897.将流气式固体220Rn源作为标准源测定220Rn测量仪测220Rn刻度系数为9.4004.提高了半导体探测法型220Rn测量仪刻度的准确性与测220Rn准确度. |
英文摘要: |
In this paper,the calibration of 220Rn measurement about semiconductor detection-based 220Rn measurement instrument have been accomplished.And the peak overlap factor and the calibration coefficient were determined by multi-channel pulse amplitude analyzer and 220Rn flow-through source respectively.The results of experiment showed that the probability of 6.78 MeV α particle emitted by 216Po slowing down to the 6.00 MeV α particle counts region can’t be ignored,and it can take 0.0897,9.4004 as typical values of peak overlap factor μ and calibration coefficient of 220Rn measurement respectively.Obviously,this work will improve the calibration and 220Rn measurement accuracy of semiconductor detection-based 220Rn measurement instrument. |
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